Layout problems in production systems and exhibitions : new models and resolution methods

Patrick SCHNEUWLY

Université de Fribourg, Département d'Informatique
CH - 1700 Fribourg

This work focuses on the layout planning of production systems and exhibitions like trade fairs, industrial fairs or annual fairs. What all problems occurring in layout planning have in common, is that they are concerned with finding an efficient spatial arrangement for facilities with constraints. By efficient we mean optimal for one or more given objectives. We are interested in the resolution of layout problems through the use of quantitative models and resolution methods which are based on general optimization methods provided by operational research. The work is divided into three sections.

The state of the art concerning models and resolution methods of layout problems is given in the first section. Most of the publications found in scientific literature refer to a layout problem in a production system, for which we describe the models and the resolution methods. Usually, a general optimization method is used for the resolution of the layout problem. We end the first section with a description of the most frequently used of these optimization methods.

The second section treats a practical layout planning problem of a manufacturing company which is subject to a restructuring of the production facilities. A mathematical model is formulated for the layout problem. However, the model cannot be solved optimally for the problem data of the portrayed manufacturing company. Therefore, we develop a new heuristic procedure: the three-phase method. A layout planning system based on this method is constructed, which supports the layout planner in the creation of layout solutions. The application of the layout planning system is described on the basis of the practical layout planning problem of the manufacturing company presented above.

The third section concentrates on a topic of layout problems which is not a subject of the scientific research to date: the arrangement of the exhibition rooms and spaces in an exhibition. The layout problem of exhibitions consists in finding an acceptable layout for both the exhibitors, the visitors, and the organizer of the exhibition. We propose two models for the representation of the exhibition spaces' arrangement. After the evaluation of the models with the problem data of an existing exhibition, one of the two models is extended to a layout software. We report on the use of the layout software in creating a layout solution for a forthcoming edition of an exhibition. Therewith, the user of the software is supported in the manual arrangement process of the exhibition spaces. Finally, we complete the developed layout software with a construction method which produces alternative layout solutions for exhibitions.

The work ends with a conclusion. First, we report on the developed tools and the experiences made with their practical applications. Then, we give the perspectives for future applications of both the layout planning system for production systems and the layout software for exhibitions. Finally, the possibilities for expansion of the developed models and resolution methods are discussed.

For further information, please contact Professor Marino Widmer
marino.widmer@unifr.ch